目錄:筱曉（上海）光子技術有限公司>>光學無源器件>>光柵微透鏡陣列色散勻化片>> S2D-24B3-0808-150-P線性硅納米印章(納米圖案硅片) (尺寸 8.0 x 8.3 mm)（ 光柵/微透鏡陣列/光色散/勻化
| 產地類別 | 進口 | 價格區間 | 面議 |
|---|---|---|---|
| 應用領域 | 電子/電池,電氣,綜合 | 組成要素 | 半導體激光器產品及設備 |
線性硅納米印章(納米圖案硅片) (尺寸 8.0 x 8.3 mm)（ 光柵/微透鏡陣列/光色散/勻化片）
LightSmyth提供了大量的納米加工單晶硅襯底，為工業和學術機構提供了一個低成本的納米光子學研究入口。基底可用于光學、光子學、生物學、化學、物理學（如中子散射）、聚合物研究、納米印跡、微流體學等領域。如果需要，基板可以涂上金屬或介質涂層。大多數地表特征具有略微梯形的橫截面輪廓，具有直線平行的臺地和溝渠。晶格狀結構也可用。提供了許多特征尺寸和溝槽深度。基板的掃描電鏡圖像可以在裝運前拍攝，以驗證準確的輪廓。
Nanopatterned Silicon Stamps
II-VI offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.
Dimensions shown in the table represent target value. Period has accuracy better than 0.5% while groove depth and the width of line and space may differ from the target values by 15%. SEM are given for illustration purposes. If more precise dimensional information is required, we may provide an SEM of the specific piece of nanostamp you order as an optional service
線性硅納米印章(納米圖案硅片) (尺寸 8.0 x 8.3 mm)（ 光柵/微透鏡陣列/光色散/勻化片）
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